发明名称 INTERFERENCE MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an interference measuring apparatus capable of shortening time required for measurement by reducing mechanical operation and also suppressing a motion artifact. SOLUTION: The interfererence measuring apparatus 1 includes: a light source 11 for outputting a light P including two or more wavelength components; an interferometric optical system for outputting an interference light RI which is generated in such a way that a first reflective light R<SB>1</SB>generated by reflecting a first branch light P<SB>1</SB>to an object to be measured 9 may be made to interfere with a second reflective light R<SB>2</SB>generated by reflecting a second branch light P<SB>2</SB>to a reflective mirror 73; a first lens 21 provided in the optical on the path of a first branch light P<SB>1</SB>; a second lens 22 provided in the optical path of the second branch light P<SB>2</SB>; and an imaging part 51 for imaging an interference pattern of the interference light RI. A focal position of each wavelength component due to the first lens 21 caused by an axial chromatic aberration of the first lens 21, is located in a line in the optical axial direction of the first branch light P<SB>1</SB>, and images an interference pattern in a different optical axial direction position for every wavelength component in the image pick-up part 51. COPYRIGHT: (C)2010,JPO&amp;INPIT
申请公布号 JP2010025864(A) 申请公布日期 2010.02.04
申请号 JP20080190079 申请日期 2008.07.23
申请人 HAMAMATSU PHOTONICS KK 发明人 YAMAUCHI TOYOHIKO;IWAI HIDENAO
分类号 G01B9/02;G01B11/24 主分类号 G01B9/02
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