| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of forming a patterned retardation control functional layer by applying a photosensitive composition containing a polymerizable liquid crystal on a substrate, exposing the composition through a mask, developing an uncured portion of the photosensitive composition coating layer with an organic solvent and rinsing, wherein no residue of the photosensitive composition is produced on the substrate and an optimally patterned retardation control functional layer can be formed. <P>SOLUTION: The method of forming a patterned retardation control functional layer includes applying a photosensitive composition on a substrate and preliminary baking, then exposing the layer of the composition by using a mask, developing an uncured portion of the photosensitive composition coating layer with an organic solvent, rinsing followed by post baking to form a patterned retardation control functional layer, and is characterized by rinsing by use of an aqueous rinsing liquid containing a comb-shaped polymeric carboxylic acid as a polymer surfactant. <P>COPYRIGHT: (C)2010,JPO&INPIT |
