发明名称 WAVEFRONT GENERATION OPTICAL SYSTEM AND WAVEFRONT ABERRATION MEASURING SYSTEM
摘要 PROBLEM TO BE SOLVED: To generate a light flux having an excellent wavefront shape regardless of a polarization state of an illumination light flux. SOLUTION: A wavefront generation optical system includes a pinhole mask (14) for generating a spherical light wave, and a phase plate (16) for compensation arranged on the emission side of the pinhole mask (14). A phase shift distribution imparted to two polarized components of each mutually-different incident light by the phase plate (16) for compensation is set to be a distribution for compensating or reducing a phase shift distribution imparted to the two polarized components of the incident light by the pinhole mask (14). COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010025609(A) 申请公布日期 2010.02.04
申请号 JP20080184517 申请日期 2008.07.16
申请人 NIKON CORP 发明人 TSUKAMOTO HIROYUKI
分类号 G01M11/02 主分类号 G01M11/02
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