PHOTOACID GENERATORS AND LITHOGRAPHIC RESISTS COMPRISING THE SAME,申请号WO2009US46957-传众专利搜索

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发明名称	PHOTOACID GENERATORS AND LITHOGRAPHIC RESISTS COMPRISING THE SAME
摘要	The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
申请公布号	WO2009152276(A3)	申请公布日期	2010.02.04
申请号	WO2009US46957	申请日期	2009.06.10
申请人	UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE;GONSALVES, KENNETH, E.;WANG, MINGXING	发明人	GONSALVES, KENNETH, E.;WANG, MINGXING
分类号	C07C381/12;G03F7/00	主分类号	C07C381/12
代理机构		代理人
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