发明名称 SUBSTRATE FOR FORMING HOLLOW STRUCTURE, AND HOLLOW STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a substrate for forming a hollow structure, from which large-area and uniform hollow structure is fabricated. SOLUTION: The substrate for forming the hollow structure is used for forming a plastic material film (G) on the surface of the substrate 1 that has a gas storing space 3 composed of a plurality of recesses 2, and then for stretching and deforming the plastic material film by an expanding pressure of the gas enclosed in the gas storing space 3 to fabricate the hollow structure 5. A flat part 4 is provided in the end part of the substrate 1, with the gas storing space 3 arranged on the surface of the substrate 1 other than the flat part 4 thereof. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010023368(A) 申请公布日期 2010.02.04
申请号 JP20080188585 申请日期 2008.07.22
申请人 RICOH CO LTD 发明人 MASUZAWA MASAHIRO;OGAKI TAKASHI;KANEMATSU TOSHIHIRO;OSHIMA HISAYOSHI;AOKI SHINJI;SENOO SHINYA
分类号 B29D22/00 主分类号 B29D22/00
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