摘要 |
PROBLEM TO BE SOLVED: To provide a substrate for forming a hollow structure, from which large-area and uniform hollow structure is fabricated. SOLUTION: The substrate for forming the hollow structure is used for forming a plastic material film (G) on the surface of the substrate 1 that has a gas storing space 3 composed of a plurality of recesses 2, and then for stretching and deforming the plastic material film by an expanding pressure of the gas enclosed in the gas storing space 3 to fabricate the hollow structure 5. A flat part 4 is provided in the end part of the substrate 1, with the gas storing space 3 arranged on the surface of the substrate 1 other than the flat part 4 thereof. COPYRIGHT: (C)2010,JPO&INPIT |