发明名称 |
GAS-LIQUID REACTION APPARATUS AND GAS-LIQUID REACTION METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To keep the consumption of a reactive gas to the minimum. Ž<P>SOLUTION: A gas-liquid reaction apparatus is provided with: a reaction vessel 10 having a reaction space 11; a liquid material supply unit 20 for supplying a liquid material, containing a reactive substrate, to the reaction space; a gas supply unit 30 for supplying the reactive gas to the reaction space; a liquid pool part 41 which is connected to the reaction space and has a liquid pool space 45 for accumulating a production liquid produced by reacting the reactive substrate with the reactive gas; and a discharge unit 40 for discharging the production liquid in the liquid pool part while keeping the reaction space and the liquid pool space in hermetically-sealed states. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010023023(A) |
申请公布日期 |
2010.02.04 |
申请号 |
JP20090056775 |
申请日期 |
2009.03.10 |
申请人 |
OSAKA PREFECTURE UNIV;YOKOGAWA ELECTRIC CORP |
发明人 |
YANAGI NICHIKEI;FUKUYAMA TAKAHIDE;SHINTANI YUKIHIRO;SATO MITSUE;TAKENAKA KAZUMA;SUZUKI KENTARO;ISOZAKI KATSUMI |
分类号 |
B01J10/00;C07B61/00 |
主分类号 |
B01J10/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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