发明名称 GAS-LIQUID REACTION APPARATUS AND GAS-LIQUID REACTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To keep the consumption of a reactive gas to the minimum. Ž<P>SOLUTION: A gas-liquid reaction apparatus is provided with: a reaction vessel 10 having a reaction space 11; a liquid material supply unit 20 for supplying a liquid material, containing a reactive substrate, to the reaction space; a gas supply unit 30 for supplying the reactive gas to the reaction space; a liquid pool part 41 which is connected to the reaction space and has a liquid pool space 45 for accumulating a production liquid produced by reacting the reactive substrate with the reactive gas; and a discharge unit 40 for discharging the production liquid in the liquid pool part while keeping the reaction space and the liquid pool space in hermetically-sealed states. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010023023(A) 申请公布日期 2010.02.04
申请号 JP20090056775 申请日期 2009.03.10
申请人 OSAKA PREFECTURE UNIV;YOKOGAWA ELECTRIC CORP 发明人 YANAGI NICHIKEI;FUKUYAMA TAKAHIDE;SHINTANI YUKIHIRO;SATO MITSUE;TAKENAKA KAZUMA;SUZUKI KENTARO;ISOZAKI KATSUMI
分类号 B01J10/00;C07B61/00 主分类号 B01J10/00
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