发明名称 RESISTANCE CHANGE ELEMENT, METHOD FOR MANUFACTURING THE SAME, AND SEMICONDUCTOR MEMORY
摘要 A resistance change element including a first electrode; a second electrode; and an oxide film, including an oxide of the first electrode, formed at sides of the first electrode and sandwiched between the first electrode and the second electrode in a plurality of regions, wherein at least one of the regions includes a resistance part whose resistance value changes in accordance with a voltage applied to the first and second electrodes.
申请公布号 US2010027319(A1) 申请公布日期 2010.02.04
申请号 US20090511722 申请日期 2009.07.29
申请人 FUJITSU MICROELECTRONICS LIMITED 发明人 NOSHIRO HIDEYUKI
分类号 G11C11/00;H01L21/16;H01L47/00 主分类号 G11C11/00
代理机构 代理人
主权项
地址