发明名称 INTEGRATED CIRCUIT AND METHOD FOR MANUFACTURING AN INTEGRATED CIRCUIT
摘要 <p>Integrated circuit comprising a substrate carrying at least one transistor comprising an alternating grid (1) of source and drain regions (D, S) separated by a grid (14) of gate regions, e.g. a checkerboard pattern of source and drain regions. The source regions (S) are vertically connected to a first metal layer and the drain regions (D) are vertically connected to a second metal layer. At least one of the first metal layer and the second metal layer comprises a metal grid (30, 40) of a plurality of interconnected metal portions (32, 42) arranged such that said grid comprises a plurality of gaps (34, 44) for connecting respective substrate portions to a further metal layer. Method for manufacturing such an integrated circuit.</p>
申请公布号 WO2010013195(A1) 申请公布日期 2010.02.04
申请号 WO2009IB53272 申请日期 2009.07.28
申请人 NXP B.V.;VAN DEN BOOM, JEROEN 发明人 VAN DEN BOOM, JEROEN
分类号 H01L29/78;H01L29/06;H01L29/10;H01L29/417;H01L29/423 主分类号 H01L29/78
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