发明名称 |
ALIGNMENT OF COLLECTOR DEVICE IN LITHOGRAPHIC APPARATUS |
摘要 |
<p>A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).</p> |
申请公布号 |
WO2010012589(A1) |
申请公布日期 |
2010.02.04 |
申请号 |
WO2009EP59048 |
申请日期 |
2009.07.15 |
申请人 |
ASML NETHERLANDS B.V.;KLAASSEN, MICHEL;VAN SCHOOT, JAN;DUTARTRE, SYLVAIN |
发明人 |
KLAASSEN, MICHEL;VAN SCHOOT, JAN;DUTARTRE, SYLVAIN |
分类号 |
G03F7/20;G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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