发明名称 CALCULATION METHOD, PROGRAM AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a calculation method for calculating a light intensity distribution formed on an image plane of a projection optical system in a short period of time. <P>SOLUTION: The calculation method causes a computer to calculate the light intensity distribution formed on the image plane of the projection optical system when an original is lit using a lighting optical system and an image of a pattern of the original is projected on a substrate through the projection optical system. The method includes the steps of determining whether an effective light source formed on a pupil plane of the projection optical system is divided into a plurality of areas if the original is not arranged on an object plane of the projection optical system; dividing the effective light source into the plurality of areas when it is determined that the effective light source is divided into the plurality of areas; calculating, for each of the plurality of areas, the light intensity distribution formed on the image plane of the projection optical system; and synthesizing light intensity distributions of the plurality of respective areas together. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010027693(A) 申请公布日期 2010.02.04
申请号 JP20080184152 申请日期 2008.07.15
申请人 CANON INC 发明人 SEKINE YOSHIYUKI;YAMAZOE KENJI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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