| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for creating a pattern for reducing deviation from a design pattern of a post-etching feature caused by a step feature that generates after rule-base OPC used for correcting a residual component of an OPC model. <P>SOLUTION: When an input design data is subjected to rule-base proximity correction in the process of forming a pattern based on the design data of an electronic device on a substrate to be exposed, the pattern is moved by calculating a correction amount by using a pattern side as a unit and then subjected to the model-base proximity correction to create an exposure data. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
