| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning device and a cleaning method of a semiconductor substrate or the like which effectively suppress reattachment while suppressing adverse effect on quality of the semiconductor substrate or the like. Ž<P>SOLUTION: The cleaning device 1 cleans an SiC substrate 50 as an object to be cleaned, which is formed of a semiconductor or material including the semiconductor. The cleaning device includes a cleaning tank 11 for holding a cleaning liquid 16, a substrate holder 12 arranged inside the cleaning tank 11 for holding the SiC substrate 50, a heater 13 for convecting the cleaning liquid 16 by adjusting a temperature of the cleaning liquid 16, and a filter 14 for trapping deposit dropped from the SiC substrate 50. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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