发明名称 PROGRAMMABLE RESISTIVE MEMORY CELL WITH SELF-FORMING GAP
摘要 A memory device has a first electrode, a second electrode, and memory material defining an inter-electrode current path between the first electrode and the second electrode. A gap is formed by shrinkage of the shrinkable material between the memory material and a shrinkable material next to the memory material.
申请公布号 US2010029062(A1) 申请公布日期 2010.02.04
申请号 US20090576099 申请日期 2009.10.08
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 LUNG HSIANG LAN
分类号 H01L21/30 主分类号 H01L21/30
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