发明名称 |
METHOD AND APPARATUS FOR CONTROLLING DIAMETER OF A SILICON CRYSTAL INGOT IN A GROWTH PROCESS |
摘要 |
An improvement to a method and an apparatus for growing a monocrystalline silicon ingot from silicon melt according to the CZ process. The improvement performs defining an error between a target taper of a meniscus and a measured taper, and translating the taper error into a feedback adjustment to a pull-speed of the silicon ingot. The conventional control model for controlling the CZ process relies on linear control (PID) controlling a non-linear system of quadratic relationship defined in the time domain between the diameter and the pull-speed. The present invention transforms the quadratic relationship in the time domain between the diameter and the pull-speed into a simile, linear relationship in the length domain between a meniscus taper of the ingot and the pull-speed. The present invention applies a linear control (modified PID) which operates in the length domain, and controls a system that has a linear relationship between the ingot taper and the pull-speed in the length domain to control the diameter of a growing silicon ingot.
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申请公布号 |
US2010024716(A1) |
申请公布日期 |
2010.02.04 |
申请号 |
US20080184016 |
申请日期 |
2008.07.31 |
申请人 |
ORSCHEL BENNO;KEARNS JOEL;TAKANASHI KEIICHI;TODT VOLKER |
发明人 |
ORSCHEL BENNO;KEARNS JOEL;TAKANASHI KEIICHI;TODT VOLKER |
分类号 |
C30B15/20 |
主分类号 |
C30B15/20 |
代理机构 |
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地址 |
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