发明名称 |
A FILM DEPOSITING APPARATUS AND METHOD |
摘要 |
<p>A film depositing apparatus comprises: a vacuum vessel; an evacuating unit for evacuating the interior of the vacuum vessel; a gas supply source for supplying the vacuum vessel with gases necessary for film deposition; a backing plate that is placed within the vacuum vessel for holding a target formed by sintering; a substrate holder for holding a deposition substrate within the vacuum vessel in a face-to-face relation with the backing plate; and a power supply unit for supplying electric power between the backing plate and the substrate holder to generate a plasma within the vacuum vessel, wherein the backing plate has a smaller thermal expansion coefficient than that of the target which has a sinter density of at least 95%, the sinter density representing the ratio of the actual weight of a sintered form of the target to its theoretical weight.</p> |
申请公布号 |
WO2010013831(A1) |
申请公布日期 |
2010.02.04 |
申请号 |
WO2009JP63829 |
申请日期 |
2009.07.29 |
申请人 |
FUJIFILM CORPORATION;FUJII, TAKAMICHI;ARAKAWA, TAKAMI;NIHEI, YASUKAZU |
发明人 |
FUJII, TAKAMICHI;ARAKAWA, TAKAMI;NIHEI, YASUKAZU |
分类号 |
C23C14/34;H01L21/28;H01L21/285 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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