| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a glass substrate for imprint, a resist pattern forming method, and a method and an apparatus for inspecting the glass substrate for imprint, with which high-sensitivity, high-inspection speed and high-throughput can be achieved with respect to a pattern and an extraneous substance with ultra fine size. <P>SOLUTION: The glass substrate 30 for imprint has a glass substrate 10 having a pattern surface 11 where a fine pattern 15 for imprint is formed, and the pattern surface is coated with a transmissive conductive film 20. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
