| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an underlayer film forming composition which is superior in suitability to embedding, ensures a small amount of a sublimate, and can form an underlayer film superior in etching resistance and having a good refraction coefficient and a good decay coefficient. <P>SOLUTION: The underlayer film forming composition includes (A) a polymer having a predetermined structural unit, (B) a crosslinking agent having a butyl ether group, and (C) a solvent. <P>COPYRIGHT: (C)2010,JPO&INPIT |
