| 发明名称 |
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR RESIST PATTERN FORMATION |
| 摘要 |
A resist composition for immersion exposure including a resin component (A) that exhibits changed alkali solubility under the action of acid, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) having an acid-generating group that generates acid upon irradiation.
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| 申请公布号 |
US2010028799(A1) |
申请公布日期 |
2010.02.04 |
| 申请号 |
US20050721957 |
申请日期 |
2005.12.01 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
TSUJI HIROMITSU;MATSUMARU SHOGO |
| 分类号 |
G03F7/20;G03F7/004 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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