发明名称 HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMAL TREATMENT AND METHOD OF OPERATING
摘要 <p>A high throughput processing system having a chemical treatment system and a thermal treatment system for processing a plurality of substrates is described. The chemical treatment system is configured to chemically treat a plurality of substrates in a dry, non-plasma environment. The thermal treatment system is configured to thermally treat a plurality of substrates chemically treated in the chemical treatment system.</p>
申请公布号 WO2010014384(A1) 申请公布日期 2010.02.04
申请号 WO2009US50401 申请日期 2009.07.13
申请人 TOKYO ELECTRON LIMITED;WALLACE, JAY, R.;HAMELIN, THOMAS;TAKAHASHI, HIROYUKI;LAFLAMME, ARTHUR, H.;WHYMAN, GREGORY, R. 发明人 WALLACE, JAY, R.;HAMELIN, THOMAS;TAKAHASHI, HIROYUKI;LAFLAMME, ARTHUR, H.;WHYMAN, GREGORY, R.
分类号 B44C1/22 主分类号 B44C1/22
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