HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMAL TREATMENT AND METHOD OF OPERATING
摘要
<p>A high throughput processing system having a chemical treatment system and a thermal treatment system for processing a plurality of substrates is described. The chemical treatment system is configured to chemically treat a plurality of substrates in a dry, non-plasma environment. The thermal treatment system is configured to thermally treat a plurality of substrates chemically treated in the chemical treatment system.</p>
申请公布号
WO2010014384(A1)
申请公布日期
2010.02.04
申请号
WO2009US50401
申请日期
2009.07.13
申请人
TOKYO ELECTRON LIMITED;WALLACE, JAY, R.;HAMELIN, THOMAS;TAKAHASHI, HIROYUKI;LAFLAMME, ARTHUR, H.;WHYMAN, GREGORY, R.
发明人
WALLACE, JAY, R.;HAMELIN, THOMAS;TAKAHASHI, HIROYUKI;LAFLAMME, ARTHUR, H.;WHYMAN, GREGORY, R.