发明名称 ALIGNER, EXPOSURE SYSTEM, EXPOSING METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an aligner, an exposure system, an exposing method and a device manufacturing method, more flexibly coping with information of an earthquake. <P>SOLUTION: The aligner performs processing relating to exposure using a substrate and includes a control device for selecting at least one of first processing for controlling a processing state of the device and second processing different from the first processing to be performed based on the information of the earthquake. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010027781(A) 申请公布日期 2010.02.04
申请号 JP20080186032 申请日期 2008.07.17
申请人 NIKON CORP 发明人 FUJIMA TOSHIHISA;TERAJIMA SHINSUKE
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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