发明名称 MICROWAVE PLASMA PROCESSING APPARATUS, AND METHOD OF SUPPLYING MICROWAVES
摘要 <P>PROBLEM TO BE SOLVED: To prevent the occurrence of abnormal discharge by optimizing a transmission path of microwaves, using a radial line slot antenna. <P>SOLUTION: In the microwave plasma processing apparatus 10, the microwaves are transmitted using a space demarcated by a rectangular waveguide 305, a coaxial converter 310, an inner conductor 315, an outer conductor 340, a taper-shaped connector 320, and the radial line slot antenna 205. When the microwaves are propagated inside a wave retardation plate 205a covered with a metal film 205b using thermal spraying, a microwave current flows through an interface of the metal film 205b in the antenna. A gap G between the rectangular waveguide 305 and the coaxial converter 310 is managed so as to be within a range of (k&plusmn;n)mm (n&le;0.1) relative to a predetermined reference gap kmm (k&ge;0.3) by a fitting structure F. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010027588(A) 申请公布日期 2010.02.04
申请号 JP20080284160 申请日期 2008.11.05
申请人 TOKYO ELECTRON LTD 发明人 NISHIMOTO SHINYA;NOZAWA TOSHIHISA;ISHIBASHI KIYOTAKA;TIAN CAI ZHONG
分类号 H05H1/46;C23C4/08;C23C4/18;C23C16/511 主分类号 H05H1/46
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