ELECTRON BEAM DRAWING DEVICE, ELECTRON BEAM DRAWING METHOD, METHOD OF MANUFACTURING DISK, AND METHOD OF MANUFACTURING INFORMATION RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To continuously draw a pattern at a high accuracy along a plurality of circumference tracks. SOLUTION: After pattern drawing is started along a circumference track CTr1from a drawing starting position SP1on the circumference track CTr1, an electron beam is deflected to the X axis at a position at which a substrate is rotated by 2π-Δθte1. Thus, the incidence position of the electron beam is positioned on the circumference track CTr2. Then, after pattern drawing is started along a circumference track CTr2from a drawing starting position SP2on the circumference track CTr2, an electron beam is deflected to the X axis at a position at which the substrate is rotated by 2π+Δθte1+Δθte2((4π+Δθte2)-(2π-Δθte1)). Thus, the incidence position of the electron beam is positioned on the circumference track CTr3. COPYRIGHT: (C)2010,JPO&INPIT