发明名称 RESISTIVE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A resistive memory device and a method for manufacturing the same are provided to improve the endurance of a resistivity memory device by preventing the occurrence of a set stuck phenomenon when a memory device is operated. CONSTITUTION: A bottom electrode(13) is formed on a substrate(10). A resistance layer(14) is formed on the bottom electrode. An upper electrode(16) is formed on the resistance layer. An oxygen diffusion prevention pattern(15b) is included in the interface of the upper electrode and the resistance layer. The oxygen diffusion prevention pattern is made from a thin film. Multiple oxygen diffusion prevention patterns are separated from each other.
申请公布号 KR20100011318(A) 申请公布日期 2010.02.03
申请号 KR20080072475 申请日期 2008.07.24
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, YU JIN
分类号 H01L27/105 主分类号 H01L27/105
代理机构 代理人
主权项
地址