| 摘要 |
PURPOSE: A cleaning composition is provided to facilitate safe processing due to high water content, to clean the multiple surface, and hydrophobic and hydrophilic surface of metal and dielectrics. CONSTITUTION: A cleaning composition comprises a third organic amine, organic acid, salt-containing fluoride, the effective amount of corrosion inhibitor, and balance water. The pH of composition is pH 8 - pH 9. The corrosion inhibitor is asxorbic acid which is included in the amount of 0.5% - 5%. The third organic amine is 2-dimethylaminoethanol and is included in the amount of 10% - 20%.
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