发明名称 Oblique incidence interferometer
摘要 <p>An oblique incidence interferometer 1 configured to measure a shape of measurement objective surface S by irradiating the measurement objective surface S with coherent light in an oblique direction to a normal of the measurement objective surface S to cause a measurement beam reflected from the measurement objective surface S to interfere with a reference beam, the oblique incidence interferometer including a light source configured to emit the coherent light; a beam dividing unit 14 configured to divide the coherent light from the light source 11 into the measurement beam and the reference beam, polarizing directions of both beams being perpendicular to each other; a first beam deflection unit 15 configured to fold the measurement beam divided by the beam dividing unit 14 to cause the folded measurement beam to enter the measurement objective surface S at a predetermined angle to the measurement objective surface S; a second beam deflection unit 16 configured to fold the measurement beam reflected by the measurement objective surface S; and a beam combining unit 17 configured to combine the measurement beam folded by the second beam deflection unit 16 with the reference beam.</p>
申请公布号 EP2149777(A2) 申请公布日期 2010.02.03
申请号 EP20090166527 申请日期 2009.07.28
申请人 MITUTOYO CORPORATION 发明人 KURIYAMA, YUTAKA;KAWASAKI, KAZUHIKO
分类号 G01B9/02 主分类号 G01B9/02
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