| 发明名称 |
Projection exposure apparatus with luminous flux distribution |
| 摘要 |
An exposure system is provided for illuminating a fine pattern that may have features extending along orthogonal first and second linear directions. An illumination source may be provided having decreased intensity portions at a center and defined along the first and second directions.
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| 申请公布号 |
US7656504(B1) |
申请公布日期 |
2010.02.02 |
| 申请号 |
US19950376676 |
申请日期 |
1995.01.20 |
| 申请人 |
NIKON CORPORATION |
发明人 |
SHIRAISHI NAOMASA |
| 分类号 |
G03B27/54;G03B27/42;G03B27/72;G03F1/14;G03F7/20;G03F9/00 |
主分类号 |
G03B27/54 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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