发明名称 |
Lithographic apparatus and control method |
摘要 |
A lithographic apparatus includes a movable part and a controller to control a position quantity of the movable part. The controller includes a first controller transfer function and a second controller transfer function. A selector selects the first controller transfer function or the second controller transfer function depending on a state of the movable part. The first controller transfer function may be chosen in a substantially stationary state of the movable part, while in a substantially non-stationary state of the movable part, the second controller transfer function may be chosen.
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申请公布号 |
US7657334(B2) |
申请公布日期 |
2010.02.02 |
申请号 |
US20050227445 |
申请日期 |
2005.09.16 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DE VOS YOUSSEF KAREL MARIA;KUNST RONALD CASPER;TSO YIN TIM;KAMIDI RAMIDIN IZAIR |
分类号 |
G05B19/18;G05B11/32;G06F19/00 |
主分类号 |
G05B19/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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