发明名称 Reclaiming substrates having defects and contaminants
摘要 Test substrates used to test semiconductor fabrication tools are reclaimed by reading from a database the process steps performed on each test substrate and selecting a reclamation process from a plurality of reclamation processes. The reclamation process can include crystal lattice defect or metallic contaminant reduction treatments for reclaiming each test substrate. Each test substrate is sorted and placed into a group of test substrates having a common defect or contaminant reduction treatment assigned to the test substrates of the group. Additional features are described and claimed.
申请公布号 US7657390(B2) 申请公布日期 2010.02.02
申请号 US20050265237 申请日期 2005.11.02
申请人 APPLIED MATERIALS, INC. 发明人 VEPA KRISHNA;BHATNAGAR YASHRAJ;RAYANDAYAN RONALD;WANG HONG
分类号 G06F19/00 主分类号 G06F19/00
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