发明名称 Method of forming thin film
摘要 There is provided a method of forming a thin film of vinylidene fluoride homopolymer having crystal form I which is applicable to various substrates in relatively easy way (coating conditions, application method, etc.), a process for preparing a vinylidene fluoride homopolymer having crystal form I efficiently at high purity, and novel vinylidene fluoride homopolymers which can give a thin film being excellent in ferroelectricity. The method of forming a thin film of vinylidene fluoride homopolymer comprises (i) a step for preparing a green powder product of vinylidene fluoride homopolymer comprising crystal form I alone or as main component by subjecting vinylidene fluoride to radical polymerization in the presence of a bromine compound or iodine compound having 1 to 20 carbon atoms which contains at least one moiety represented by -CRf1Rf2X1, wherein X1 is iodine atom or bromine atom; Rf1 and Rf2 are the same or different and each is selected from fluorine atom or perfluoroalkyl groups having 1 to 5 carbon atoms and (ii) a step for forming a thin film on a substrate surface by using vinylidene fluoride homopolymer which comprises crystal form I alone or as main component and is obtained from the green powder product of vinylidene fluoride homopolymer comprising crystal form I alone or as main component.
申请公布号 US7655742(B2) 申请公布日期 2010.02.02
申请号 US20050231992 申请日期 2005.09.22
申请人 DAIKIN INDUSTRIES, LTD. 发明人 ARAKI TAKAYUKI;KODANI TETSUHIRO
分类号 B05D7/24;C08F14/18;B32B27/30;C08F2/38;C08F14/22;C08F114/22;C09D127/16;C23C14/12 主分类号 B05D7/24
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