METHOD OF FORMING CLICHE FOR RESIST PATTERN-PRINTING APPARATUS

摘要

PURPOSE: A method of forming a cliche for a resist pattern-printing apparatus is provided to form the cliche in a mold forming method by forming a photoresist on a master substrate with desired width and depth of a groove. CONSTITUTION: A first photo resist pattern with first thickness(d1) and first width(w1) corresponding to the first thickness is formed on the master board. The second photoresist pattern with the second thickness(d2) and the second width(w2) is formed on the master board. The curing resin is spread on the master board. The back plate is attached above the curing resin. The curing resin is cured. The curing resin and the back plate are separated from the master board.