| 摘要 |
<p>Disclosed is a cleaning solvent which enables to form a thin film that hardly causes the falling-off of its component(s) therefrom. Specifically disclosed is a solvent for cleaning an organic thin film, which is characterized in that the solubility of a polymer produced by the hydrolytic polycondensation of n-octadecyltrimethoxysilane with KOH in the solvent is 100 to 400 mg/g at 25°C. The solvent is preferably an aromatic hydrocarbon solvent comprising at least one compound represented by the formula (I)[wherein R's independently represent a C-Calkyl group; and n represents a number of 2, 3 or 4], and is particularly preferably diethylbenzene or Solvesso (registered trade name).</p> |
