COMPOUND SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND COMPOUND SEMICONDUCTOR DEVICE USING THE SAME

摘要

PURPOSE: A compound semiconductor substrate, method for manufacturing the same, and compound semiconductor device using the same are provided to improve the photonic efficiency of the semiconductor device. CONSTITUTION: The substrate(10) is prepared. Substrate is etched. The rough pattern is formed in the surface of substrate. The reflective film(20) is evaporated in the total surface of substrate. In order that a part of the reflective film remains in the sidewall part of the unevenness pattern, a part of the reflective film is controlled. Compound semiconductor layers(41,43) are formed in the top of the substrate. The reflective film reflects the light of the substrate side with the semiconductor layer. The quantity of radiation absorbed by the substrate based on of substrate is reduced.