发明名称 Thin-film device and method of manufacturing same
摘要 A thin-film device comprises a substrate and a capacitor provided on the substrate. The capacitor incorporates: a lower conductor layer; a dielectric film a portion of which is disposed on the lower conductor layer; and an upper conductor layer disposed on the dielectric film. The lower conductor layer has a top surface, a side surface, and a corner portion formed by the top and side surfaces. The upper conductor layer incorporates an upper electrode portion having a bottom surface opposed to the top surface of the lower conductor layer with the dielectric film disposed in between. When seen from above the upper conductor layer, the periphery of the bottom surface of the upper electrode portion is located inside the periphery of the top surface of the lower conductor layer without touching the periphery of the top surface of the lower conductor layer.
申请公布号 US7652349(B2) 申请公布日期 2010.01.26
申请号 US20060583074 申请日期 2006.10.19
申请人 TDK CORPORATION 发明人 KUWAJIMA HAJIME;MIYAZAKI MASAHIRO;FURUYA AKIRA
分类号 H01L29/41 主分类号 H01L29/41
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