Method of manufacturing gray scale mask and microlens, microlens, spatial light modulating apparatus and projector

摘要

A gray scale mask having distribution of light transmittance determined for the purpose of exposing a resist layer with a predetermined pattern, wherein the distribution of the light transmittance is determined so that the resist layer having been exposed in accordance with a first resist shape would be used to form a second resist shape with an aspect ratio higher than the aspect ratio of the first resist shape.