发明名称 Filament member, ion source, and ion implantation apparatus
摘要 A filament member configured to discharge thermions may be employed in an ion source of an ion implantation apparatus. A filament member may include an anode disposed around a central portion of the filament member, a cathode disposed around a periphery of the filament and/or enclosing the anode, and at least one conductive path disposed between the anode and the cathode to discharge the thermions.
申请公布号 US7652264(B2) 申请公布日期 2010.01.26
申请号 US20060544595 申请日期 2006.10.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KWON UI-HUI;KIM TAI-KYUNG;KEUM GYEONG-SU;CHUNG WON-YOUNG;CHA KWANG-HO
分类号 H01T23/00 主分类号 H01T23/00
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