发明名称 |
Filament member, ion source, and ion implantation apparatus |
摘要 |
A filament member configured to discharge thermions may be employed in an ion source of an ion implantation apparatus. A filament member may include an anode disposed around a central portion of the filament member, a cathode disposed around a periphery of the filament and/or enclosing the anode, and at least one conductive path disposed between the anode and the cathode to discharge the thermions.
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申请公布号 |
US7652264(B2) |
申请公布日期 |
2010.01.26 |
申请号 |
US20060544595 |
申请日期 |
2006.10.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KWON UI-HUI;KIM TAI-KYUNG;KEUM GYEONG-SU;CHUNG WON-YOUNG;CHA KWANG-HO |
分类号 |
H01T23/00 |
主分类号 |
H01T23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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