发明名称 PLASTICS ETCHING COMPOSITION
摘要 <p>The present invention provides a composition for the etching treatment of the non-conductive surface before chemical metallization. The etching composition contains (in mass percent): sulfuric acid 70-90, manganese salts 0,0001-0,01, water - residual amount. The concentration of the used sulfuric acid not less than 75 percent.@</p>
申请公布号 LT2008055(A) 申请公布日期 2010.01.25
申请号 LT20080000055 申请日期 2008.07.18
申请人 CHEMIJOS INSTITUTAS, , 发明人 NARUSKEVICIUS, LEONAS,;BARANAUSKAS, MYKOLAS,;SIMKUNAITE, BIRUTE,
分类号 C23C18/18;C23C18/20 主分类号 C23C18/18
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