发明名称 |
METHOD OF PROCESSING WAFER |
摘要 |
PURPOSE: A method for processing a wafer is provided to form a relaxation gettering layer and a segregation gettering layer on one wafer at the same time by forming the segregation gettering layer on a lower side of the wafer by an ion implantation process. CONSTITUTION: A wafer(100) is formed. A thermal process is performed on the wafer. A relaxation gettering layer(102) is formed on the surface of the wafer with the thermal process. An ion implantation process with high density is performed on a lower side of the wafer for collecting metal impurities of the wafer. A boron ion is used for the ion implantation process. An ion implantation layer like a segregation gettering layer(106) is formed on a part adjacent to the lower side of the wafer. The segregation gettering layer has high solid solubility.
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申请公布号 |
KR20100006906(A) |
申请公布日期 |
2010.01.22 |
申请号 |
KR20080067228 |
申请日期 |
2008.07.10 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
AN, JEONG HOON;MOON, BYEONG SAM |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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