发明名称 INTERCONNECTION STRUCTURE AND ELECTRONIC DEVICE EMPLOYING THE SAME
摘要 PURPOSE: An interconnection structure and electronic device employing the same are provided to improve the degree of integration by reducing the sizes of the wirings. CONSTITUTION: The first connection pattern(25) is located in the level higher than the first, and second device (D1, D2). The upper connection pattern(40) is located in the level higher than the first, and second device. Therefore, and, the other device can be formed between the first device region (DR1) and the second device region (DR2). The width and the reduction of interval among upper wirings of upper wirings are minimized.
申请公布号 KR20100007247(A) 申请公布日期 2010.01.22
申请号 KR20080067795 申请日期 2008.07.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, HAN BYUNG;JUNG, SOON MOON;LIM, HOON
分类号 H01L21/28 主分类号 H01L21/28
代理机构 代理人
主权项
地址