| 摘要 |
PURPOSE: An apparatus and method for drying substrates is provided to prevent the sudden temperature degradation of the surface of substrate. CONSTITUTION: The apparatus for drying substrate(10) using the IPA (Isopropyl Alcohol) comprises the container, the elevating member(200), the supporting member(300), the upper nozzle part(400) and lower nozzle part(500). In the upper nozzle part, the IPA solution and N2 gas are sprayed. In the lower nozzle part, the heated pure water is sprayed. In the upper nozzle part, the N2 gas is sprayed. In the lower nozzle part, the heated deionized water is sprayed to the bottom surface of substrate.
|
