EXPOSURE METHOD AND MEMORY MEDIUM STORING COMPUTER PROGRAM

摘要

PURPOSE: An exposure method and memory medium storing computer program are provided to reduce the total time for optimization. CONSTITUTION: The mask pattern is set(S101). The fixed value for the phase calculation is set (S102). The entry value of the exposure condition is set (S103). The evaluation condition is set (S104). The effective light source distribution is set (S105). The pattern phase is calculated with the optical simulation (S106). The pattern line width is calculated (S106). The evaluation value is calculated (S109). The exposure condition is determined (S111).