| 摘要 |
PURPOSE: An inductively coupled plasma reactor is provided to improve controllability about a plasma ion energy using the variable control of a power level and a power distribution ratio. CONSTITUTION: A reactive chamber(10) has a plasma discharge area. A wireless frequency antenna(30) supplies induced electromotive force for generating the plasma discharge in the plasma discharge area. A dielectric window(20) is installed between the wireless frequency antenna and the discharge area of the reactive chamber. A power supply unit(40) supplies the wireless frequency power to the wireless frequency antenna. A power variable distribution circuit(42) includes a variable magnetic core for varying the power and varies the wireless frequency power supplied from the power supply unit according to the displacement of the variable magnetic core. |
