| 摘要 |
PURPOSE: A curable composition for nanoimprint is provided to ensure low viscosity and high pattern precision, to be suitable for use required for high resilience rate of a spacer or protection film, and to form a highly precise micro-pattern. CONSTITUTION: A curable composition for nanoimprint contains (A) a polymerizable monomer and (B) a photopolymerization initiator. 90 mass % or more of a solid portion of the composition is the polymerizable monomer having at least two polymerizable groups. 10 mass % or more of a solid portion of the composition is the polymerizable monomer having at least three polymerizable groups. |
