CONTROL SYSTEM OF CHEMICAL MECHANICAL POLISHING EQUIPMENT AND METHOD FOR CONTROLLING POLISHING TIME THEREOF

摘要

PURPOSE: A control system of chemical mechanical polishing equipment and a method for controlling a polishing time thereof are provided to improve accuracy of a polishing time by correcting an error of the polishing time due to the deterioration of a component. CONSTITUTION: A sample logic unit(230) calculates a sample process time about the sample of a product. A main process logic unit(220) calculates a main process time about a current lot of the product by the sample process time. A correction logic unit(240) calculates the difference value of the polishing time due to the time interval of a feedback timing and the current timing. A process controller(210) controls the polishing time due to the deterioration of the component of the chemical mechanical polishing equipment by adding the main process time to the difference value.