CLEANING SOLUTION FOR QUARTZ PART AND METHOD OF CLEANING USING THE SAME

摘要

PURPOSE: A cleaning solution for quartz parts is provided to effectively remove an impurity thin film and particle remaining on the surface of quartz parts applied to a semiconductor manufacturing apparatus without excessive damage to the quartz parts. CONSTITUTION: A cleaning solution for removing thin film and particle remaining on the surface of quartz parts applied to a semiconductor manufacturing apparatus comprises an ammonium compound 5-20 weight%, acidic oxidizer 10-55 weight%, fluorine compound 5-30 weight% and extra water. A method for cleaning the quartz parts comprises the steps of: (S120) providing the cleaning solution for quartz parts to the quartz parts with remaining impurity thin film; and (S130) removing the impurity thin film by a cleaning process.