发明名称 MASK AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A mask and method for manufacturing the same is provided to reduce the flare noise [flare noise] between the main pattern and dummy pattern. CONSTITUTION: The mask(400) comprises the main pattern (A), and a plurality of the dummy pattern (B,C) and light blocking film. The main pattern is formed on the reticle substrate. A plurality of dummy patterns is separated from the main pattern in the predetermined distance (H). A plurality of dummy patterns is arranged on the reticle substrate. The light blocking layer is formed among a plurality of dummy patterns. The main pattern and dummy patterns is MoSi. The light shield layer is Cr.
申请公布号 KR20100007387(A) 申请公布日期 2010.01.22
申请号 KR20080068000 申请日期 2008.07.14
申请人 DONGBU HITEK CO., LTD. 发明人 KIM, JONG DOO
分类号 H01L21/027 主分类号 H01L21/027
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