| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing apparatus of a liquid crystal device, by which film quality of an inorganic alignment layer is improved by preventing attachment of a sputtered particle to a region where on attachment the particle adversely affects the film quality of the inorganic alignment layer, without disposing a shutter between a film depositing chamber and a sputtering apparatus. Ž<P>SOLUTION: The manufacturing apparatus of the liquid crystal device is equipped with: the film depositing chamber 2; the sputtering apparatus 3 for depositing an alignment layer material on a substrate W via a sputtering method so as to form the inorganic alignment layer in the film depositing chamber 2; and a conveyance tray 6 for holding and conveying the substrate W, and the manufacturing apparatus is characterized in that a capturing member 6c to capture the sputtered particle 5p ejected from the sputtering apparatus 3 is mounted on a rear face 6r of the conveyance tray 6 opposite from the face holding the substrate W. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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