发明名称 |
FLAW INSPECTION DEVICE AND FLAW INSPECTION METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To accurately grasp a flaw on each film or in each film by accurately controlling a focus position in the inspection of the flaw in a laminated film constitution. Ž<P>SOLUTION: A flaw inspection device (1) includes a refractive index measuring means (10) for measuring the refractive index on a wafer, a flaw detecting optical system (20) for acquiring the image data of the wafer to detect the flaw of the wafer and a control part (45) for classifying the measured refractive index at every film kind and determining the focus position of a flaw imaging optical system from designed deposition information. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010014439(A) |
申请公布日期 |
2010.01.21 |
申请号 |
JP20080172625 |
申请日期 |
2008.07.01 |
申请人 |
FUJITSU MICROELECTRONICS LTD |
发明人 |
AKABOSHI FUMIHIKO |
分类号 |
G01N21/956;G01N21/00;G01N21/41;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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