| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film-forming apparatus which can form a film in a state that moisture is sufficiently removed. Ž<P>SOLUTION: The film-forming apparatus 100 has a first exhaust unit 60 including a cryopump 63, a second exhaust unit 70 including a MBP or a TMP, and a valve-switching part 82 for switching a valve between the first exhaust unit 60 and the second exhaust unit 70. The film-forming apparatus satisfies both of the sufficient removal of moisture and the discharge of gas in a film-forming operation, by switching the first exhaust unit 60 to the second exhaust unit 70 with the valve-switching part 82, after having finished removing the moisture with the first exhaust unit 60. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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