发明名称 INNER CAVITY SYSTEM FOR NANO-IMPRINT LITHOGRAPHY
摘要 A nano-imprint lithography template system having a support layer with at least one port, and a patterned surface layer coupled to the support layer. Coupling of the patterned surface layer to the support layer forms a cavity. Pressure within the cavity is controlled through the port of the support layer.
申请公布号 US2010015270(A1) 申请公布日期 2010.01.21
申请号 US20090498748 申请日期 2009.07.07
申请人 MOLECULAR IMPRINTS, INC. 发明人 CHOI BYUNG-JIN;SELINIDIS KOSTA S.
分类号 B29C59/02 主分类号 B29C59/02
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