| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a color filter polishing pad capable of stably removing foreign matter or protrusions occurring on a filter at a high polishing rate during a color filter manufacturing step and also obtaining high quality of a polished surface, and a method of polishing a color filter using the color filter polishing pad. <P>SOLUTION: The problem is solved first by a composition for forming the color filter polishing pad containing (A) polyurethane having a carbon-carbon double bond and (B) a crosslinking agent. The (A) polyurethane further includes one or more selected from a vinyl group (CH<SB>2</SB>=CH-) and an allyl group (CH<SB>2</SB>=CH-CH<SB>2</SB>-) in a side chain. <P>COPYRIGHT: (C)2010,JPO&INPIT |
